| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method capable of efficiently preventing a charge-up phenomenon and manufacturing a phase shift mask with high accuracy. SOLUTION: An ITO film 6 is formed by application on a transparent insulation substrate 1 on which a light shielding film pattern 4 is formed. A registry 5 is laminated on it and electronic line plotting is performed to an area to be a phase shifter part 8. In this case, since earth is performed by the light shielding film pattern 4, pressure by a metal needle is intensified and no loose connection is generated. In addition, this method is constituted so that the ITO film 6 is brought into contact with the entire area of the light shielding film pattern 4 and no electrically isolated pattern exists. Consequently, since the registry 5 is not charged and no charge-up phenomenon is generated, patterning accuracy of the register 5 is enhanced and the phase shift mask with high accuracy is obtained.</p> |
