发明名称 Calibration method for magnetically enhanced reactive ion etcher
摘要 A method of calibrating the magnetic coils of a magnetically enhanced reactive ion etcher includes taking magnetic field measurements outside of a closed plasma chamber and correlating such measurements to the magnetic field within the chamber. One or more factors are established which when applied to measurements taken externally yield results representative of measurements taken internally.
申请公布号 US6545468(B2) 申请公布日期 2003.04.08
申请号 US20010920913 申请日期 2001.08.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD 发明人 KUO HUI MING;CHENG STRELLSON
分类号 H01J37/32;(IPC1-7):G01R33/02;G01R31/06;H01L21/66;H05H1/02;C23F1/00 主分类号 H01J37/32
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