发明名称 SUBSTRATE PROCESSING DEVICE AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To prevent the vapor of a processing solution from condensing in a space where a mechanism for transmitting a driving force to a rotary member such as a cleansing brush is housed. SOLUTION: An air feed pipe connection hole 381 and an air exhaust pipe connection hole 382 are provided to an arm cover 324 of a brush swinging arm 32. One end of an air feed pipe 383 is kept open in a space outside a wafer processing space 1, and the other end is connected to the air feed pipe connection hole 381. One end of an air exhaust pipe 384 is connected to the air exhaust pipe connection hole 382. The other end of the air exhaust pipe 384 is connected to a vacuum pump 385. The vacuum pump 385 is actuated; an atmosphere in an internal space inside a brush swinging arm 32, a bearing block 33, and an up - down rotary shaft 361 is made to flow into the air exhaust pipe 384; and furthermore an atmosphere outside the wafer processing space 1 is made to flow into the above internal space from the air feed pipe 383. By this setup, the above internal space can be ventilated.
申请公布号 JP2003100692(A) 申请公布日期 2003.04.04
申请号 JP20010297595 申请日期 2001.09.27
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAWADA ATSUSHI
分类号 G02F1/13;G02F1/1333;H01L21/304;(IPC1-7):H01L21/304;G02F1/133 主分类号 G02F1/13
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