发明名称 Projection optical system, method of making projection optical system, method of making illumination optical system, and method of making exposure apparatus
摘要 In a projection optical system for projecting and transferring a pattern on a projection original R onto a photosensitive substrate W, one or a plurality of lenses having an in-homogeous radial refractive index about the optical axis are used, while one or a plurality of aspheric surfaces for correcting the aberration resulting from the in-homogeousness in refractive index of lenses are provided.
申请公布号 US2003063394(A1) 申请公布日期 2003.04.03
申请号 US20020237685 申请日期 2002.09.10
申请人 NIKON CORPORATION 发明人 SUZUKI TAKESHI;TANAKA ISSEY
分类号 G02B13/14;G02B13/18;G02B27/00;G03F7/20;(IPC1-7):G02B3/00;G02B9/00 主分类号 G02B13/14
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