发明名称 |
Projection optical system, method of making projection optical system, method of making illumination optical system, and method of making exposure apparatus |
摘要 |
In a projection optical system for projecting and transferring a pattern on a projection original R onto a photosensitive substrate W, one or a plurality of lenses having an in-homogeous radial refractive index about the optical axis are used, while one or a plurality of aspheric surfaces for correcting the aberration resulting from the in-homogeousness in refractive index of lenses are provided.
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申请公布号 |
US2003063394(A1) |
申请公布日期 |
2003.04.03 |
申请号 |
US20020237685 |
申请日期 |
2002.09.10 |
申请人 |
NIKON CORPORATION |
发明人 |
SUZUKI TAKESHI;TANAKA ISSEY |
分类号 |
G02B13/14;G02B13/18;G02B27/00;G03F7/20;(IPC1-7):G02B3/00;G02B9/00 |
主分类号 |
G02B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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