发明名称 POLYSTYROLHARZZUSAMMENSETZUNG, SOWIE ORIENTIERTER POLYSTYROLFILM
摘要 <p>The present invention relates to a styrenic resin composition which comprises 90 to 99.99% by weight of a styrenic polymer having a high degree of syndiotctic configuration (SPS) and 0.01 to 10% by weight of a spherical aluminosilicate having pH in the range of 5 to 11; a polystyrene oriented film which comprises the above styrenic resin composition molded into an oriented film; a styrenic resin composition which comprises 99.2 to 99.95% by weight of a styrenic polymer having a high degree of syndiotactic configuration and 0.05 to 0.8% by weight of a spherical regular elastomer having an average grain size in the range of 0.1 to 3 mu m, and which has a melt index at 300 DEG C under 2.16kg load being in the range of 1 to 50; and a polystyrene oriented film which comprises the asbove styrenic resin composition molded into an oriented film. According to the present invention, there are provided styrenic resin compositions each being excellent in melt-heat-stability, minimized in the generation of white powders at the time of continuous film forming and capable of producing oriented films that are favorable in slipperiness, dielectric breakdown voltage (AC), tear strength and the like; and polystyrene oriented films useful as a variety of base materials for films.</p>
申请公布号 DE69529738(D1) 申请公布日期 2003.04.03
申请号 DE1995629738 申请日期 1995.11.28
申请人 IDEMITSU PETROCHEMICAL CO., LTD. 发明人 FUNAKI, KEISUKE;OKADA, AKIHIKO;UCHIDA, TAKAAKI
分类号 B29C55/00;C08J5/18;C08K3/34;C08K3/36;C08K7/18;C08L25/06;C08L33/00;(IPC1-7):C08L25/00;C08L53/00;C08L9/00;C08L21/00;B29C55/02;C08L51/00 主分类号 B29C55/00
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