发明名称 Coating substrates for optical components involves turning substrate as material is applied and actively limiting angle of incidence to specified limit
摘要 The method involves arranging at least one substrate so that the surface can be coated by a material source with ejected material incident at an angle while turning the substrate about a rotation axis, controlling the radial thickness profile so the incident quantity depends on radial distance of the coating point from the rotation axis, specifying an angle of incidence limit and actively limiting this angle. The method involves arranging at least one substrate relative to a material source so that the surface of the object to be coated facing the material source can be coated with coating material ejected by the source at an angle of incidence, while turning the substrate about a substrate rotation axis, controlling a radial thickness profile so that the quantity incident on the surface depends on the radial distance of the coating point from the rotation axis, specifying an angle of incidence limit and actively limiting the angle so that it never exceeds the limit. Independent claims are also included for the following: a coating system for coating substrates for optical components, an optical component and an optical coating.
申请公布号 DE10237430(A1) 申请公布日期 2003.04.03
申请号 DE20021037430 申请日期 2002.08.12
申请人 CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG 发明人 BAUER, HARRY;HELLER, MATTHIAS;PAUL, HANS-JOCHEN;ULLMANN, JENS;ZACZEK, CHRISTOPH;SCHEIBLE, PATRICK
分类号 C23C14/04;C23C14/50;G02B1/10;(IPC1-7):C23C14/54 主分类号 C23C14/04
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