发明名称 ANTIREFLECTION FILM
摘要 PROBLEM TO BE SOLVED: To provide an antireflection film having a DLC film which is thin and can maintain sufficient durability in an antireflection film having a DLC film used as a protective film. SOLUTION: In the antireflection film essentially comprising an antireflection film applied on the surface of a base material and a protective film applied on the surface of the antireflection film, a DLC film having 1 nm to 20 nm film thickness and containing fluorine by 0.01 to 2.0 atomic ratio of F/C is formed as the protective film by vacuum thin film deposition techniques using a mixture gas of a hydrocarbon and hydrogen fluoride or a hydrocarbon and carbon fluoride. Preferably, the fluorine content is continuously increased in the thickness direction of the DLC film from the antireflection film side to the air side.
申请公布号 JP2003098305(A) 申请公布日期 2003.04.03
申请号 JP20010285848 申请日期 2001.09.19
申请人 SUMITOMO METAL MINING CO LTD 发明人 ABE TAKAYUKI
分类号 G02B1/11;B32B7/02;B32B9/00;G02B1/10;G09F9/00 主分类号 G02B1/11
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