发明名称 Holder for semiconductor wafer in flat surface polishing device, has metal plate provided with several through-holes whose internal circumferences are chamfered and coated with resin layer
摘要 A metal plate (4) has through-holes (1) for holding semiconductor wafer. The internal circumference of each hole is chamfered and covered with a resin layer. An Independent claim is also included for manufacturing method of holder.
申请公布号 DE10145594(A1) 申请公布日期 2003.04.03
申请号 DE2001145594 申请日期 2001.09.15
申请人 SUMITOMO BAKELITE CO. LTD., TOKIO/TOKYO;ARTLITE KOGYO CO. LTD., MIHARA;UTK SYSTEM CO. LTD., SAGAMIHARA;C.R.T. CO. LTD., KANAGAWA 发明人 NANJO, MOTOYUKI;UCHIHATA, KOUJI;UZAWA, AKIHIKO;KANAI, KUNIYUKI
分类号 B24B37/04;B24B37/27;B24B37/28;B24B41/06;(IPC1-7):B24B41/06 主分类号 B24B37/04
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