Method for making an Al2O3 film

摘要

An aluminum oxide deposited film of the invention, comprising a substrate film and an aluminum oxide deposit layer of which the peel strength to the substrate film in a wet state is at least 0.3 N/15mm, has an oxygen permeability of not more than 40 ml/m<2>.day.MPa and a water vapor permeability of not more than 4.0 g/ m<2>.day. The deposition ratio (A/B) of a fluorescent X-ray intensity (A) kcps (aluminum K alpha -ray) of the aluminum oxide deposited film (1) to a fluorescent X-ray intensity (B) kcps (aluminum K alpha -ray) of an aluminum deposited film (2) obtained without feeding oxygen is (A/B) ≤ 0.85.