发明名称 THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD
摘要 PURPOSE: A thin film forming apparatus and a thin film forming method are provided to favorably transfer a thin film to a substrate. CONSTITUTION: A thin film forming apparatus comprises a processing container(1) whose inside is a thin film forming chamber, substrate holding means which holds a substrate in the thin film forming chamber, film holding means which is disposed to face the substrate holding means in the thin film forming chamber, and holds a sheet film(8) in a condition that a thin film disposed on a surface of the sheet film is directed toward the substrate, loading means which moves at least one of the substrate holding means and the film holding means, presses the substrate and the sheet film against each other, and transfers the thin film to the substrate, and pressure controlling means which adjusts the pressure inside the thin film forming chamber in accordance with an operating state of at least the loading means.
申请公布号 KR20030026218(A) 申请公布日期 2003.03.31
申请号 KR20020052542 申请日期 2002.09.02
申请人 DAINIPPON SCREEN SEIJO K.K.;NIPPON TELEGRAPH AND TELEPHONE CORPORATION 发明人 ISEKI IZURU;KYURAGI HAKARU;MACHIDA KATSUYUKI;SATO NORIO;UEYAMA TSUTOMU
分类号 H01L21/31;B05D1/28;B32B37/10;B32B38/00;H01L21/00;H01L21/30;H01L21/687;(IPC1-7):H01L21/30 主分类号 H01L21/31
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