发明名称 OZONE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an ozone treatment apparatus which can form an oxide film of sufficient thickness on the surface of a substrate by guiding high-density ozone gas to the substrate surface. SOLUTION: The ozone treatment apparatus is equipped with a mount base on which the substrate is mounted, a heating means which heats the substrate on the mount base, and a gas supply means which supplies treatment gas containing ozone to the substrate on the mount base. The gas supply means is equipped with a supply pipe 22 which is equipped with a treatment gas duct 22c to which the treatment gas flows and is composed of multiple pipes 22a and 22b and an exhaust pipe 23 which communicates with the treatment gas duct 22c and extends from the supply pipe 22 to the K substrate. Further, the ozone treatment apparatus is equipped with a cooling flow circulation means which supplies cooling liquid into a cooling liquid duct 22d and circulates it.
申请公布号 JP2003092289(A) 申请公布日期 2003.03.28
申请号 JP20010284861 申请日期 2001.09.19
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 SHIMODA KYOJI;KIKUCHI TATSUO
分类号 H01L21/31;(IPC1-7):H01L21/31 主分类号 H01L21/31
代理机构 代理人
主权项
地址