| 摘要 |
PROBLEM TO BE SOLVED: To provide an inexpensive and efficient device and/or an efficient method for obtaining a functional deposition film of high quality when forming the functional deposition film. SOLUTION: In a vapor phase deposition film manufacturing device comprising a sealable reaction chamber, a substrate holder to install a cylindrical substrate in the reaction chamber, and a deposition film forming means for performing vapor phase growth of the deposition film on the cylindrical substrate arranged on the substrate holder, the substrate holder has a substrate rotating mechanism to rotate the cylindrical substrate installed on the substrate holder around the central axis by using hydraulic power. In a deposition film manufacturing method, the vapor phase growth of the deposition film is performed while rotating the cylindrical substrate around the central axis by using the manufacturing device utilizing the hydraulic power.
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