发明名称 |
RUN-TO-RUN CONTROL METHOD FOR PROPORTIONAL-INTEGRAL-DERIVATIVE (PID) CONTROLLER TUNING FOR RAPID THERMAL PROCESSING (RTP) |
摘要 |
A method is provided, the method comprising measuring at least one parameter characteristic of rapid thermal processing performed on a workpiece in a rapid thermal processing step, and modeling the at least one characteristic parameter measured using a first-principles radiation model. The method also comprises applying the first-principles radiation model to modify the rapid thermal processing performed in the rapid thermal processing step. |
申请公布号 |
WO02067297(A3) |
申请公布日期 |
2003.03.27 |
申请号 |
WO2001US43415 |
申请日期 |
2001.11.06 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
RILEY, TERRENCE, J.;CAMPBELL, WILLIAM, JARRETT |
分类号 |
G05B11/42;G05B13/04 |
主分类号 |
G05B11/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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