发明名称 |
REDUCING DEPOSITION OF PROCESS RESIDUES ON A SURFACE IN A CHAMBER |
摘要 |
A process chamber 35 capable of processing a substrate 30 and monitoring a process conducted on the substrate 30, comprises a support 45, a gas inlet, a gas energizer, an exhaust 85, and a wall 38 having a recess 145 that is sized to reduce the deposition of process residues therein. A process monitoring system 35 may be used to monitoring a process that may be conducted on a substrate 30 in the process chamber 25 through the recess 145 in the wall 38.
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申请公布号 |
WO0225696(A9) |
申请公布日期 |
2003.03.27 |
申请号 |
WO2001US29802 |
申请日期 |
2001.09.21 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GRIMBERGEN, MICHAEL, N.;QIAN, XUE-YU |
分类号 |
H05H1/00;C23C14/00;C23C16/44;H01J37/32;H01L21/3065;H05H1/46;(IPC1-7):H01J37/32 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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