发明名称 Mask and method of manufacturing the same, electroluminescence device and method of manufacturing the same, and electronic instrument
摘要 A method of manufacturing a mask includes attaching to a first substrate formed with an opening a second substrate formed with a plurality of penetrating holes. The plurality of penetrating holes are disposed inside the opening. The first substrate and the second substrate may be joined together by anode coupling. First and second alignment marks may be used for positioning the second substrate and the first substrate when attaching the second substrate to the first substrate.
申请公布号 US2003059690(A1) 申请公布日期 2003.03.27
申请号 US20020247570 申请日期 2002.09.20
申请人 SEIKO EPSON CORPORATION 发明人 YOTSUYA SHINICHI
分类号 H01L51/50;C23C14/04;G03F7/12;H05B33/10;H05B33/12;(IPC1-7):G03C5/00;G03F9/00 主分类号 H01L51/50
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