Shape and look-up table based design rule checking (DRC) for physical verification of integrated circuit layouts

摘要

Design rule checking (DRC) can be applied to a mask layout using a shape-based system. A shape includes a set of associated edges in a specified configuration. Design rules can then be based on various shapes, advantageously enabling efficient formulation and precise application of design rules. A concurrent processing methodology can be used to minimize processing overhead during this rule application. Design rules can also be incorporated into a lookup table (LUT) to further reduce DRC runtime by substantially minimizing the number of times a design rule must actually be calculated. A LUT can also improve DRC runtime for edge-based, concurrent processing DRC systems. A DRC system can also be connected to a network across which design rules and mask layout data files can be accessed and retrieved.