APPARATUS FOR SENSING WAFER

摘要

PURPOSE: An apparatus for sensing a wafer is provided to detect the deformation of a wafer due to an alignment error and a temperature gradient of the wafer by using a device for observing the inside of a chamber. CONSTITUTION: A process module(100) of a plasma process chamber includes a chamber(120) and a storage device(140). The chamber(120) is formed with an inlet tube(123) for receiving necessary materials from the storage device(140) and an outlet tube(124) for exhausting gases. The chamber(120) is divided by an insulating plate(126). The inside of the chamber(120) is divided into the first region(128a) and the second region(128b). A plasma generation source(150) is mounted into the first region(128a). A chuck(130) is installed in the second region(128b) in order to grasp a wafer(1). A bias source(160) is mounted in the inside of the chuck(130). A viewer port(250) is installed on a sidewall of the chamber(120).