发明名称 Vertical metal oxide silicon field effect semiconductor diodes
摘要 The present invention includes methods and apparatus as described in the claims. Briefly, semiconductor diodes having a low forward conduction voltage drop, a low reverse leakage current, a high voltage capability and avalanche energy capability, suitable for use in integrated circuits as well as for discrete devices are disclosed. The semiconductor diodes are diode configured vertical cylindrical metal oxide semiconductor field effect devices having one diode terminal as the common connection between the gates and drains of the vertical cylindrical metal oxide semiconductor field effect devices, and one diode terminal as the common connection with the sources of the vertical cylindrical metal oxide semiconductor field effect devices. The method of manufacturing the vertical cylindrical metal oxide semiconductor field effect devices is disclosed. Various device terminations can be employed to complete the diode devices. Various embodiments are disclosed.
申请公布号 US6537921(B2) 申请公布日期 2003.03.25
申请号 US20010864436 申请日期 2001.05.23
申请人 VRAM TECHNOLOGIES, LLC 发明人 METZLER RICHARD A.
分类号 H01L29/866;H01L21/329;H01L21/336;H01L27/08;H01L29/78;H01L29/861;(IPC1-7):H01L21/00 主分类号 H01L29/866
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