发明名称 Methods for fabricating protective structures for bond wires
摘要 A method for fabricating a protective structure for bond wires of a semiconductor device assembly which includes sequentially fabricating one or more layers of the protective structure. After a first layer is formed, each subsequent layer is superimposed upon, contiguous with, and mutually adhered to an underlying layer of the protective structure. Such structure may be used to protect the bond wires of a test apparatus, which connect the contact pads of a carrier substrate of the test apparatus to corresponding bond pads of a test substrate. In addition, a fence member may be assembled with or formed on the test substrate to align and receive a semiconductor device and, thereby, to facilitate assembly of the semiconductor device with the test substrate. The fence member can be formed integrally with the protective structures or secured over the protective structures. Stereolithographic processes may be used to fabricate the fence member.
申请公布号 US6537842(B2) 申请公布日期 2003.03.25
申请号 US20010944504 申请日期 2001.08.30
申请人 MICRON TECHNOLOGY, INC. 发明人 AKRAM SALMAN
分类号 G01R1/04;H01L21/68;(IPC1-7):H01L21/00 主分类号 G01R1/04
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