发明名称 Underfill and encapsulation of carrier substrate-mounted flip-chip components using stereolithography
摘要 A method for underfilling and encapsulating flip-chip configured semiconductor devices mounted on a carrier substrate using stereolithography (STL) to form, in situ, at least semisolid dam structures of photopolymeric material about the devices to entrap liquid, unpolymerized resin between the devices and substrate. Prior to the STL process, the carrier substrate and mounted devices are immersed in the liquid polymeric resin, optionally with vibratory energy, to purge contaminants from between the device and substrate, and to fill spaces between the semiconductor devices and carrier substrate with the liquid resin.
申请公布号 US6537482(B1) 申请公布日期 2003.03.25
申请号 US20000633915 申请日期 2000.08.08
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.
分类号 B29C67/00;B29C70/72;H01L21/56;H01L23/31;H05K3/28;(IPC1-7):B29C35/08;B29C70/70;B29C70/74 主分类号 B29C67/00
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