发明名称 Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
摘要 Embodiments include a semiconductor device and a method for manufacturing the same, which simplify the manufacturing steps and provide split gate type non-volatile memory transistors and other device elements mounted on the same chip. In one method, the step of forming the lower electrode of a capacitor 540 and the step of forming a floating gate 40 of a memory transistor 400 are conducted in different steps. As a result, characteristics of the floating gate 40 and characteristics of the lower electrode 54 can be independently optimized. On the other hand, the step of forming a control gate 36 of the memory transistor 400 and the step of forming an upper electrode 58 of the capacitor 540 are conducted in the same step. As a result, the manufacturing process is simplified.
申请公布号 US6537869(B1) 申请公布日期 2003.03.25
申请号 US20000663258 申请日期 2000.09.15
申请人 SEIKO EPSON CORPORATION 发明人 FURUHATA TOMOYUKI
分类号 H01L21/8247;H01L21/8242;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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