发明名称 |
HIGH THROUGHPUT CHEMICAL ANALYSIS BY IMPROVED DESORPTION/IONIZATION ON SILICON MASS SPECTROMETRY |
摘要 |
A method of making improved substrates for desorbing and ionizing analytes takes an n-type semiconductor substrate and provides a strong light source. By focusing the illumination from the light source onto the n-type semiconductor substrate results in at least one lit region on the n-type semiconductor substrate. The substrate is electrochemically etched with a low current during illumination to form at least one sample reservoir, each sample reservoir being formed at a respective lit region on the n-type semiconductor substrate. |
申请公布号 |
WO03023839(A1) |
申请公布日期 |
2003.03.20 |
申请号 |
WO2002US28996 |
申请日期 |
2002.09.12 |
申请人 |
MASS CONSORTIUM CORPORATION |
发明人 |
SHEN, ZHOUXIN;SIUZDAK, GARY |
分类号 |
C25F3/12;G01N1/00;H01J49/16;(IPC1-7):H01L21/302;H01J49/04 |
主分类号 |
C25F3/12 |
代理机构 |
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代理人 |
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地址 |
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