摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron emission element, an electron source substrate, an image forming device, and the manufacturing method thereof, in which accurate alignment is unnecessary, manufacturing cost is low, the characteristics of the electron emission element does not change even in the long time operation, the electron emission element is not broken, and high quality is kept for along time. SOLUTION: The manufacturing method of the electron emission element comprises a process forming a pair of adjacent element electrodes 2, 3 on an insulating substrate; a process forming a conductive film 6 having an opening part 9 containing adjacent parts of the element electrodes 2, 3 on the element electrodes 2, 3; a process forming a conductive thin film 4 in the opening part 9 by dropping a solution containing a conductive thin film forming material in the form of a liquid drop in the opening part and baking it; and a process forming an electron emission part 5 in the conductive thin film 4.</p> |