| 摘要 |
PURPOSE: An organometallic precursor for forming the metal pattern and a method for forming the metal pattern using the precursor are provided, to enable the electrically conductive metal pattern to be formed easily by direct exposure without using a photosensitive resin. CONSTITUTION: The organometallic precursor is represented by L'-M-L, wherein M is a transition metal selected from the group consisting of Ag, Au, Cu, Pd, Ni and Pt; L is an imidazolylidene compound represented by the formula 2; and L' is an imidazolylidene compound represented by the formula 2 or a β-diketonate compound represented by the formula 3. In the formula 2, R1 to R4 are independent each another and are H, an alkyl group of C1-C20, an alkenyl group, an alkynyl group, a carboxylic group, an alkoxy group, an ester group or an aromatic hydrocarbon group; and in the formula 3, R5 to R7 are independent each another and are H, an alkyl group of C1-C20, an alkenyl group, an alkynyl group, a carboxylic group, an alkoxy group, an ester group or an aromatic hydrocarbon group.
|
