| 发明名称 |
Process for treating a conductive surface and products formed thereby |
| 摘要 |
The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a silicate containing coating or film upon a metallic or conductive surface. |
| 申请公布号 |
AU2002329681(A1) |
申请公布日期 |
2003.03.18 |
| 申请号 |
AU20020329681 |
申请日期 |
2002.08.02 |
| 申请人 |
ELISHA HOLDING LLC |
发明人 |
NANCY G. HEIMANN;BRUCE FLINT;WILLIAM M. DALTON;ROBERT L. HEIMANN;RAVI CHANDRAN;BRANKO POPOV |
| 分类号 |
C25D9/08;(IPC1-7):C25D9/08;C25D5/48 |
主分类号 |
C25D9/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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