发明名称 |
Cleaning agent for a semi-conductor substrate |
摘要 |
This invention relates to a cleaning agent for a semi-conductor substrate, particularly, one having copper wirings on its surface, comprising a nonionic surfactant and a method for cleaning the same.The said cleaning agent and the method have made it possible to control a speed of etching on silicone oxide so as to remove impurities adsorbed on copper wirings and silicone oxide on a surface of a semi-conductor substrate having copper wirings on its surface, such as copper oxides and particles, without causing corrosion or oxidation of copper wirings nor causing roughness on the surface.
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申请公布号 |
US6534458(B1) |
申请公布日期 |
2003.03.18 |
申请号 |
US20000712904 |
申请日期 |
2000.11.16 |
申请人 |
WAKO PURE CHEMICAL INDUSTRIES, LTD. |
发明人 |
KAKIZAWA MASAHIKO;UMEKITA KEN-ICHI;HAYASHIDA ICHIRO |
分类号 |
C11D1/62;C11D1/72;C11D1/722;C11D1/835;C11D11/00;H01L21/02;H01L21/321;(IPC1-7):C11D1/66;C11D3/26 |
主分类号 |
C11D1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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