| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist application method which keeps the quality of products in applying the photoresist by slit coating method. SOLUTION: A developer unit 20 is so structured as to fill a developer container 21 with coating liquid of a negative resist developer sufficient to dip the entire top end of a coating head 10 therein and dips the tip of the head 10. A developer spray nozzle 22 is provided, projecting from the side or top face of the developer container 21 toward the tip of the head 10. The head 10 is dipped in the developer for an interval, sufficient to develop solids in the coated liquid deposited to the tip of the head 10 and the spray nozzle 22 sprays the developer, as required. |
