| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a stencil mask which has high durability and hardly deforms or damages a mask pattern. SOLUTION: The stencil mask is composed of a first stencil mask 38 having a first linear pattern 32 divided from an L-shaped pattern 22 as a mask pattern and a second stencil mask 40 having a second linear pattern 36 that is the remain of the pattern 22, as a mask pattern. At exposure, the first mask 38 is used for exposure, and then the second mask 40 is used for exposure, thereby transferring the L-shaped pattern 22 onto a wafer W.</p> |
