Exposure system of semiconductor wafer and method for operating the same

摘要

An exposure system of a semiconductor wafer and a method for operating the same capable of preventing defects in a photolithographic process. The exposure system of a semiconductor wafer comprises first and second shutters for opening or closing a light source, first and second sensing circuits for sensing the positions of the first and second shutters to generate first and second sensed signals, a controller for determining whether the first and second shutters are completely opened in response to the first and second sensed signals and for generating a control signal when the first and second shutters are not completely opened.