发明名称 |
TIN ELECTROPLATING SOLUTION AND METHOD FOR PLATING |
摘要 |
A tin electroplating solution, characterized in that it has a pH of 1.5 to 6.0 and comprises the following components: (1) 5 to 60 g/L of a tin(II) ion, (2) a complexing agent, (3) a surfactant and (4) 0.01 to 0.5 g/L of a bismuth(III) ion; and a method for the tin plating of electronic parts or the like which comprises using the tin electroplating solution. The tin electroplating solution exhibits a soldering wettability being comparable with or superior to a conventional tin−lead alloy (solder) without the use of hazardous lead or an organic brightening agent.
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申请公布号 |
WO03021008(A1) |
申请公布日期 |
2003.03.13 |
申请号 |
WO2001JP07559 |
申请日期 |
2001.08.31 |
申请人 |
LEARONAL JAPAN INC.;SUDA, KAZUYUKI;KONDO, MAKOTO |
发明人 |
SUDA, KAZUYUKI;KONDO, MAKOTO |
分类号 |
C25D3/30;C25D3/60;C25D7/00;(IPC1-7):C25D3/60 |
主分类号 |
C25D3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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