| 摘要 |
An object of the invention is to provide a position measuring apparatus which can measure position information of a mark formed on an object with high accuracy, and an exposure apparatus which can perform exposure by performing alignment highly accurately, based on the highly accurate position information measured by the position measuring apparatus, and as a result, can realize fine processing. In order to achieve the object, the present invention is a position information measuring apparatus for measuring position information of an alignment mark, by converting an image Im1 of an alignment mark formed on an image pickup plane F1 of an image pickup device into image information, while scanning the image Im1 in a scanning direction SC1, and performing calculation processing with respect to the obtained image information, wherein the measuring direction D11 of the image Im1 of the alignment mark is set so as to be orthogonal to the scanning direction SC1.
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