发明名称 RETAINING METHOD AND JIG OF METAL MASK FOR VACUUM VAPOR DEPOSITION USED FOR ORGANIC EL ELEMENT MANUFACTURING
摘要 PROBLEM TO BE SOLVED: To provide a method and jig to enable to arrange a metal mask on the surface of the substrate under the condition that the slit precision of effective part of the mask is secured. SOLUTION: The metal mask 11 provided with the effective part 11A in which numerous slits are formed on the base plate equipped with windows 14 is arranged on the base plate 15, and one end of this is fixed to the base plate 15 by means of mask clamps 20, and the other end is fixed to a movable slider 23, and the metal mask 11 is retained in a pulled state by giving a spring force to the slider 23 by a compression coil spring 30, thereby the slits are made to maintain the prescribed form. By mounting the substrate 12 on this metal mask and by carrying out the vapor deposition, the highly precise pattern can be formed on the substrate.
申请公布号 JP2003068453(A) 申请公布日期 2003.03.07
申请号 JP20010255232 申请日期 2001.08.24
申请人 DAINIPPON PRINTING CO LTD 发明人 TSUCHIYA TERUNAO;SAKATA TAKUYA
分类号 H05B33/10;C23C14/04;G09F9/00;G09F9/30;H01L27/32;H01L51/50;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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