发明名称 MULTI-FACE FORMING MASK DEVICE FOR VACUUM DEPOSITION
摘要 <p>A multi-face forming mask device for vacuum deposition, wherein a second metal mask (13) having a reed screen part (13A) with a large number of fine slits (13a) arranged parallel with each other at very small intervals is disposed on a base plate (12) commonly used as a first metal mask having a plurality of windows (18) for restricting a deposition area, one end of the second metal mask (13) is fixed to the base plate (12) with a mask clamp (20) and the other end is fixed to a slider (23), and a spring force is given to the slider (23) by compression coil springs (30) to give a tension to the reed screen part (13A) of the second metal mask so as to maintain the slits (13a) in a straight state at specified pitches, whereby ultra fine patterns can be formed on the multiple faces of a substrate (17) by disposing the substrate (17) on the second metal mask (13) and performing deposition.</p>
申请公布号 WO2003019988(P1) 申请公布日期 2003.03.06
申请号 JP2002008535 申请日期 2002.08.23
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