发明名称 Field-effect transistor based on embedded cluster structures and process for its production
摘要 Field-Effect Transistor Based on Embedded Cluster Structures and Process for Its Production In field-effect transistors, semiconductor clusters, which can extend from the source region to the drain region and which can be implemented in two ways, are embedded in one or a plurality of layers. In a first embodiment, the semiconductor material of the adjacent channel region can be strained by the clusters and the effective mass can thus be reduced by altering the energy band structure and the charge carrier mobility can be increased. In a second embodiment, the clusters themselves can be used as a canal region. These two embodiments can also appear in mixed forms. The invention can be applied to the Si material system with SiGe clusters or to the GaAs material system with InGaAs clusters or to other material systems.
申请公布号 US2003042565(A1) 申请公布日期 2003.03.06
申请号 US20020280172 申请日期 2002.10.25
申请人 SCHMIDT OLIVER G.;EBERL KARL 发明人 SCHMIDT OLIVER G.;EBERL KARL
分类号 H01L29/10;H01L29/80;(IPC1-7):H01L31/107 主分类号 H01L29/10
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