发明名称 Field-effect transistor having a contact to one of its doping regions, and method for fabricating the transistor
摘要 A field-effect transistor is formed with a gate stack, which is patterned by a hard mask and contains a first part of a gate electrode and a second part of the gate electrode that is disposed on the first part. The second part of the gate electrode, which is disposed between the patterned hard mask and the first part of the gate electrode, is laterally recessed, so that the second part of the gate electrode, in a contact hole which is subsequently formed, is at a greater distance from a contact plug with which the contact hole is filled, in order to avoid short circuits.
申请公布号 US2003042517(A1) 申请公布日期 2003.03.06
申请号 US20020231882 申请日期 2002.08.30
申请人 STOTTKO BERND;WELZEL MARTIN;ZIMMERMANN JENS 发明人 STOTTKO BERND;WELZEL MARTIN;ZIMMERMANN JENS
分类号 H01L21/60;H01L21/8242;H01L27/108;(IPC1-7):H01L29/76 主分类号 H01L21/60
代理机构 代理人
主权项
地址