发明名称 |
CHEMICAL CONCENTRATION CONTROL DEVICE |
摘要 |
<p>A system (500) and method for ensuring constant concentration ratios in multi-fluid mixtures used in wafer processing steps. In one aspect the invention is a method for supplying a multi-fluid mixture to a process tank (330) comprising: transporting a first fluid through a first supply line (110) having means to control mass flow rate of the first fluid; transporting a second fluid through a second supply line (210) having means to control mass flow rate of the second fluid; converging the first and second fluids to form a multi-fluid mixture; repetitively measuring the concentration levels of the first and second fluids in the multi-fluid mixture with a sensor (310); and upon the sensor (310) detecting undesirable concentration levels of either the first or second fluid in the multi-fluid mixture, automatically adjusting the mass flow rate of at least one of the first and second fluids to achieve desired concentration levels.</p> |
申请公布号 |
WO02082509(A8) |
申请公布日期 |
2003.03.06 |
申请号 |
WO2002US11150 |
申请日期 |
2002.04.08 |
申请人 |
AKRION LLC |
发明人 |
KASKKOUSH, ISMAIL;NOVAK, RICHARD;HELMER, TIM |
分类号 |
G05D11/13;(IPC1-7):H01L21/00 |
主分类号 |
G05D11/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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