| 摘要 |
<p>A surface treating fluid for fine processing of a multi-component glass substrate, characterized in that it contains hydrofluoric acid and also at least one acid having an acid dissociation constant greater than that of hydrofluoric acid; a surface treating fluid for fine processing of a multi-component glass substrate wherein it contains hydrofluoric acid and also at least one acid having an acid dissociation constant greater than that of hydrofluoric acid, characterized in that it contains the at least one acid having an acid dissociation constant greater than that of hydrofluoric acid in a range of (2/5)&ast;x1 < x < x2, wherein x represents the content of the at least one acid having an acid dissociation constant greater than that of hydrofluoric acid, and when f(x) [A/min] represents the rate of the etching by the surface treating fluid for a thermal silicon oxide film at the temperature at which the etching of glass substrate is carried out, the fluid has a minimum value f(x1) at x = x1 and has f(x) = {f(x2)}/2 at x = x2. The surface treating fluid has a uniform composition and allows the processing of a multi-component glass substrate itself for use, for example, in a flat panel display such as a liquid crystalline display and an organic EL display without the precipitation of crystals and the occurrence of rough portions in the surface.</p> |
