发明名称 |
Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus |
摘要 |
A pedestal of a load-cup for supporting wafers loaded onto and being unloaded from a chemical mechanical polishing (CMP) apparatus includes a pedestal plate, and a pedestal film which extends over only a limited area at the upper surface of the pedestal plate. This area includes the regions directly around the fluid ports provided in the pedestal plate for vacuum-chucking the wafers and spraying deionized water. The pedestal plate may have a cross-shaped part, the entirety of which bears the fluid ports. The pedestal film may include annular members each extending around only a respective one of the fluid ports, or one or more members each extending radially around several of the fluid ports. By offering a rather limited contact area to the wafer supported on the pedestal, the pedestal film reduces the amount of contaminants which could be transferred to the wafer surface in contact therewith.
|
申请公布号 |
US2003045219(A1) |
申请公布日期 |
2003.03.06 |
申请号 |
US20020255638 |
申请日期 |
2002.09.27 |
申请人 |
YANG YUN-SIK;KIM KYUNG-DAE;HONG HYUNG-SIK;KIM MIN-GYU |
发明人 |
YANG YUN-SIK;KIM KYUNG-DAE;HONG HYUNG-SIK;KIM MIN-GYU |
分类号 |
B24B1/00;B24B37/30;H01L21/00;H01L21/304;H01L21/68;(IPC1-7):B24B47/02 |
主分类号 |
B24B1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|