发明名称 COATING LIQUID FOR FORMING FERRODIELECTRIC THIN FILM, METHOD FOR MANUFACTURING THE SAME, AND FERRODIELECTRIC THIN FILM
摘要 PROBLEM TO BE SOLVED: To obtain a coating liquid capable of forming a ferrodielectric thin film by sintering at low temperature having excellent storage stability and reproducibility containing effective components capable of dissolving in general- purpose organic solvents. SOLUTION: This coating liquid is characterized by containing organic solvents and a reacted product which is obtained by reacting (A) organic metal compounds and (B) compounds selected from carboxylic acids, alcohols, ethers, ketones, and esters without organic solvents.
申请公布号 JP2003063825(A) 申请公布日期 2003.03.05
申请号 JP20010256558 申请日期 2001.08.27
申请人 JSR CORP 发明人 SHINODA TOMOTAKA;IKEDA NORIHIKO;KOMATSU SATOSHI;YAMADA KINJI
分类号 C01G1/00;C01G35/00;H01B3/12;H01L21/316;(IPC1-7):C01G35/00 主分类号 C01G1/00
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