发明名称 |
Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with bragg grating, and dispersion compensation device using the optical fiber |
摘要 |
<p>The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves. <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE></p> |
申请公布号 |
EP1288718(A2) |
申请公布日期 |
2003.03.05 |
申请号 |
EP20020019733 |
申请日期 |
2002.09.03 |
申请人 |
DAI NIPPON PRINTING CO., LTD.;NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
发明人 |
KURIHARA, MASAAKI;FUJIMOTO, SHIGEKAZU;KOMUKAI, TETSURO;INUI, TETSURO |
分类号 |
G02B5/18;G02B6/02;G03F1/26;G03F1/68;G03F7/00;(IPC1-7):G02B6/16;G03F1/14;G03F7/20 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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