发明名称 Self-aligned split-gate flash memory cell having a single-side tip-shaped floating-gate structure and its contactless flash memory arrays
摘要 A self-aligned split-gate flash memory cell of the present invention comprises a planarized control/select-gate conductive layer having a portion formed at least on a second gate-dielectric layer and another portion formed at least on a single-side tip-shaped floating-gate structure being formed on a first gate-dielectric layer, wherein a dielectric layer is formed over the single-side tip-shaped floating-gate structure to act as a first intergate-dielectric layer and a second intergate-dielectric layer is formed over an inner sidewall of the single-side tip-shaped floating-gate structure. The self-aligned split-gate flash memory cell is configured into two contactless array architectures: a contactless NOR-type flash memory array and a contactless parallel common-source/drain conductive bit-lines flash memory array.
申请公布号 US6528843(B1) 申请公布日期 2003.03.04
申请号 US20020137286 申请日期 2002.05.03
申请人 SILICON BASED TECHNOLOGY CORP. 发明人 WU CHING-YUAN
分类号 G11C16/04;H01L21/28;H01L21/8247;H01L27/115;H01L29/423;H01L29/788;(IPC1-7):H01L29/788 主分类号 G11C16/04
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