SUBSTRATE TREATMENT APPARATUS AND CONVEYANCE APPARATUS

摘要

PROBLEM TO BE SOLVED: To prevent dust particles from being whirled due to an air current generated when a conveyance apparatus is run in a substrate treatment apparatus represented by a semiconductor manufacturing apparatus. SOLUTION: Partition plates 5a and 5b are provided to restrain the dust particles from being moved between a transfer part 201 and a running part 203 in the conveyance apparatus 200 used to convey a substrate.