发明名称 |
METHOD OF MANUFACTURING SHADOW MASK FOR PARTICLE BEAM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing a shadow mask for a particle beam so as to make it executed within a time capable of being approved, even when a mask mold has a complicated anisotropic structure. SOLUTION: The method for manufacturing the shadow mask for the particle beam comprises the steps of calculating following geometrical dimensions: the length and direction of each of all side parts, and the sectional area of each direction by measuring openings of cells of at least one selected part amount of a cell of a model, and analytically calculating the elastic value of the selected cell from a previously selected function, including a statistical parameter derived from the calculated geometrical dimensions as a variable.</p> |
申请公布号 |
JP2003059829(A) |
申请公布日期 |
2003.02.28 |
申请号 |
JP20020220356 |
申请日期 |
2002.07.29 |
申请人 |
INFINEON TECHNOLOGIES AG;IMS IONEN MIKROFAB SYST GMBH |
发明人 |
EHRMANN ALBRECHT;HAUGENEDER ERNST;KAMM FRANK-MICHAEL;PETRASCHENKO ALEXANDER;SCHUNK STEPHAN DR |
分类号 |
G03F1/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
G03F1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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