MULTIPLE EXPOSURE LITHOGRAPHY SYSTEM AND MECHANISM FOR PREVENTING DEFORMATION OF EXPOSURE REGION OF MULTIPLE EXPOSURE LITHOGRAPHY SYSTEM

摘要

PROBLEM TO BE SOLVED: To form circuit patterns with high accuracy by preventing the deformation of exposure regions corresponding to respective modulating elements in forming the circuit patterns by using an exposure unit having a multiplicity of the modulating elements arranged in a matrix form. SOLUTION: The prescribed patterns are formed on a forming surface by multiple exposure using an exposure unit 2001 having a multiplicity of micromirrors M (m and n) arrayed in a matrix form. A shutter member 23 rotating in synchronization with the exposure operation of the micromirrors M (m and n) is disposed between the forming surface and a light source. A light transmission region 23A of the shutter member 23 crosses the optical path and guides the illumination light from the light source to the forming surface while the micromirrors M (m and n) are held static. A light shielding region 23B of the shutter member 23 crosses the optical path and shuts off the illumination light from the light source during the relative movement of the micoromirrors M (m and n).