发明名称 Moving mechanism and stage system in exposure apparatus
摘要 Disclosed is a moving mechanism which includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator being movable along the second guide surface, wherein the first and second structural members are isolated from each other with respect to vibration, such that displacement of the stator due to a reaction force as the moving member is driven does not have an influence to the moving member guide surface.
申请公布号 US2003040831(A1) 申请公布日期 2003.02.27
申请号 US20020212748 申请日期 2002.08.07
申请人 CANON KABUSHIKI KAISHA 发明人 TANAKA HIDEO;IWAMOTO KAZUNORI;TAKABAYASHI YUKIO
分类号 G12B5/00;G03F7/20;G05D3/00;H01L21/027;H01L21/68;(IPC1-7):G06F19/00 主分类号 G12B5/00
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