发明名称 Regenerating semiconductor wafers mostly made from silicon comprises determining the extent of damage on the main surfaces of the wafer, grinding and chemical-mechanical polishing the surfaces, and wet chemical cleaning
摘要 Regenerating semiconductor wafers mostly made from silicon comprises determining the extent of damage on the main surfaces of the wafer; grinding and chemical-mechanical polishing the surfaces; and wet chemical cleaning. Preferred Features: The grinding is carried out in the wet state using a diamond abrasive disk. Polishing is carried out in the presence of a polishing solution made from 0.26-normal tetramethylammonium hydroxide solution, 12 % silicon dioxide solution and 8 % aluminum sulfate solution. The wet chemical cleaning is carried out in the presence of 10-50 % hydrofluoric acid.
申请公布号 DE10137113(A1) 申请公布日期 2003.02.27
申请号 DE20011037113 申请日期 2001.07.30
申请人 INFINEON TECHNOLOGIES AG 发明人 KRAEMER, HANS;GEIDL, JOCHEN;HERRLICH, LUTZ;GOEHLER, JENS;MIMIETZ, STEFFEN;GROBITZSCH, ELISABETH;PATAKI, ANETT
分类号 H01L21/302;(IPC1-7):H01L21/302 主分类号 H01L21/302
代理机构 代理人
主权项
地址