发明名称 |
Regenerating semiconductor wafers mostly made from silicon comprises determining the extent of damage on the main surfaces of the wafer, grinding and chemical-mechanical polishing the surfaces, and wet chemical cleaning |
摘要 |
Regenerating semiconductor wafers mostly made from silicon comprises determining the extent of damage on the main surfaces of the wafer; grinding and chemical-mechanical polishing the surfaces; and wet chemical cleaning. Preferred Features: The grinding is carried out in the wet state using a diamond abrasive disk. Polishing is carried out in the presence of a polishing solution made from 0.26-normal tetramethylammonium hydroxide solution, 12 % silicon dioxide solution and 8 % aluminum sulfate solution. The wet chemical cleaning is carried out in the presence of 10-50 % hydrofluoric acid.
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申请公布号 |
DE10137113(A1) |
申请公布日期 |
2003.02.27 |
申请号 |
DE20011037113 |
申请日期 |
2001.07.30 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
KRAEMER, HANS;GEIDL, JOCHEN;HERRLICH, LUTZ;GOEHLER, JENS;MIMIETZ, STEFFEN;GROBITZSCH, ELISABETH;PATAKI, ANETT |
分类号 |
H01L21/302;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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主权项 |
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