| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a maintenance deciding method for a semiconductor manufacturing apparatus where the frequency of maintenance such as cleaning can be reduced, the maintenance cost can be reduced accordingly, and the working efficiency of the device can be improved. SOLUTION: In multiple process modules 1 to 3, when the amount of film adhering to the inside of a reaction chamber reaches a threshold for warning, it is determined whether or not an amount of a film adhering to the reaction chamber reaches a simultaneous cleaning threshold for warning in the other process modules (2 or 3). When there is amount which has reached the simultaneous cleaning threshold warning (process module 1) regarding other process modules, so as to decide for cleaning to be performed as maintenance, together with one of the process modules.
|
