发明名称 |
ORGANOSILOXANE-BASED POLYMER, PHOTOCURABLE RESIN COMPOSITION, METHOD FOR FORMING PATTERN AND FILM FOR PROTECTING SUBSTRATE |
摘要 |
PURPOSE: To produce a photocurable resin composition capable of being exposed by lights having wide wave lengths by using a novel organosiloxane-based polymer. CONSTITUTION: This organosiloxane-based polymer has a repeating unit expressed by formula (1) R¬1 to R¬4 express each a monovalent hydrocarbon group; m expresses 1-2,000 integer; X has a structure expressed by formula (2) (Me denotes methyl); R¬5 s express functional organic groups expressed by formula (3) (R' expresses H or methyl; R" expresses a divalent hydrocarbon group) which may be the same or different.
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申请公布号 |
KR20030013330(A) |
申请公布日期 |
2003.02.14 |
申请号 |
KR20020045798 |
申请日期 |
2002.08.02 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
ASAI SATOSHI;FUJII TOSHIHIKO;KATO HIDETO |
分类号 |
G03F7/075;B05D3/06;C07F7/02;C07F7/08;C07F7/10;C08F230/08;C08G77/04;C08G77/14;C08G77/52;H01L21/027;H01L21/312;(IPC1-7):C08G77/14 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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