发明名称 FINE SHAPE MAKING PROCESS AND METHOD OF MAKING MASTER OPTICAL DISK
摘要 PROBLEM TO BE SOLVED: To provide a process of making shapes having high resolution, excellent surface characteristics and high uniformity without changing the optical system of an exposure device in a technique of forming patterns by light exposure of a photoresist. SOLUTION: A laminate having a positive type photoresist layer, a photoresist layer subjected to alkaline treatment and a layer which is increased in light transmittance by photoirradiation in this order on a substrate is irradiated with light and the patterns are formed thereon by exposure.
申请公布号 JP2003045095(A) 申请公布日期 2003.02.14
申请号 JP20010230043 申请日期 2001.07.30
申请人 TEIJIN LTD;SEIKO EPSON CORP 发明人 UMEZAWA TOMOKAZU;SUGIYAMA MASATO;FUJII EIICHI;KASEYA HIROYASU
分类号 G03F7/039;G03F7/20;G11B7/26;H01L21/027 主分类号 G03F7/039
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