发明名称 |
METHOD AND APPARATUS OF CONTROLLING OXYGEN CONCENTRATION IN SILICON SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for controlling oxygen concentration in a silicon single crystal when pulling up the crystal from silicon molten liquid by CZ method. SOLUTION: An operational control factor is automatically set by performing learning control so as to reduce deviation between a measured value of oxygen concentration in a reference batch and that of objective value to zero, while excessively identifying affecting coefficient of the control factor which affects to the oxygen concentration in the crystal, based on the actual pulling up data achieved in the past.
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申请公布号 |
JP2003040694(A) |
申请公布日期 |
2003.02.13 |
申请号 |
JP20010227032 |
申请日期 |
2001.07.27 |
申请人 |
SUMITOMO MITSUBISHI SILICON CORP |
发明人 |
NAKAGAWA SHIGEMASA;TABUCHI MASATO;NAKAJIMA KATSUNORI |
分类号 |
C30B29/06;C30B15/20;(IPC1-7):C30B29/06 |
主分类号 |
C30B29/06 |
代理机构 |
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地址 |
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